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The 5th Forum on Manufacturing Paradigm III (FMP3-2026)

The 5th Forum on Manufacturing Paradigm III (FMP3) will be held from 22 to 24 May 2026 in Hong Kong. This international event focuses on the advancement of Atomic and Close-to-atomic Scale Manufacturing (ACSM)—the core of the next manufacturing revolution. FMP3 with the first forum commencing in 2019 brings together global scientists and industry leaders to discuss the forefront of Manufacturing Paradigm III, focusing on three pivotal areas: atomic-level precision processing and measurement, atomic-level construction and functional device creation, and atomic-scale manufacturing for future industries.

Originally established by Fengzhou Fang in 2012, the theory of the Three Paradigms of Manufacturing Advancement reveals an inherent law of manufacturing development. This inherent law recognizes atomic and close-to-atomic scale manufacturing as the inevitable next phase in manufacturing evolution, driven by the demand for ultra-precision and functional determinism at the atomic level. By convening leading minds and fostering interdisciplinary collaboration, FMP3 empowers scientists to contribute innovative solutions to the global paradigm shift in manufacturing.

Key discussions will address theoretical system development, interdisciplinary collaboration mechanisms, core equipment technology bottlenecks, and industrialization roadblocks. Through cross-domain dialogue, the forum is committed to promoting deep integration of fundamental research, process and equipment development, and industrial applications. FMP3 aims to accelerate the translation of ACSM research into strategic sectors such as semiconductors, quantum information, and new energy technologies, while fostering synergy between entrepreneurial and innovation chains.

 Forum Themes

  • Atomic and close-to-atomic scale manufacturing, measurement and characterization, and applications
  • Manufacturing systems of ACSM
  • Digitalization and AI for ACSM
  • Ultra-precision manufacturing and measurement
  • Micro/nano manufacturing and metrology

 

>>Registration Site<<

 

News/ Important Dates

DateDescription
04 Mar 2026Registration site is now available! 
22-24 May 2026FMP3-2026 Commences
  

 

Honarary Advisors

Wei GaoTohoku University
Huayong YangZhejiang University
Han DingHuazhong University of Science and Technology 
Lan JiangBeijing Institute of Technology
Xuejun ZhangChangchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Science
József VanczaSZTAKI, Hungarian Academy for Science
Fengzhou FangUniversity College Dublin
  

ISNM Youth Committee

Xiaokang Liu (Chair)Chongqing University of Technology
Benny Chi Fai CheungThe Hong Kong Polytechnic University
Shuming YangXi'an Jiaotong University 
Yuanliu ChenZhejiang University
Jining SunDalian University of Technology
Xinghui LiTsinghua University
Xichun LuoUniversity of Strathclyde
Rong ChenHuazhong University of Science and Technology
Gaoliang DaiPhysikalisch-Technische Bundesanstalt
Yongda YanHarbin Institute of Technology
Yuki ShimizuHokkaido University
Marco CastelliUniversity College Dublin
  

Organizing Committee

Benny Chi Fai Cheung (Chair)The Hong Kong Polytechnic University
Shuming YangXi'an Jiaotong University 
Suet ToThe Hong Kong Polytechnic University
Daniel MeyerIWT-Leibniz-Institute for Materials Engineering
Ping ZhouDalian University of Technology
Huajun CaoChongqing University
Lihui ZhouMax-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.
Aminul IslamDenmark University of Technology
Qidai ChenJilin University 
Yuki ShimizuHokkaido University
Jufang ZhangUniversity College Dublin
Hailong CuiChina Academy of Engineering Physics 
Nan YuHarbin Institute of Technology
Jianlei CuiXi'an Jiaotong University
Ziran ChenChongqing University of Technology
Chengwei KangXi'an Jiaotong University
Chunguang HuTianjin University
Hui DengSouthern University of Science and Technology
Wei YuanSouth China University of Technology
Min LaiTianjin University
Fusheng LiangSoochow University
Christopher MusgraveResearch Ireland
Wenlong LuHuazhong University of Science and Technology
Ruslan  MelentievUniversity of Nottingham
Honggang ZhangBeijing University of Technology
  

Organized by

 

 

Contact Us

Dr Ho Lai Ting Lesley / Ms Choy Yan Ting Crystal / Ms Loh Yee Man Kristy
Email: lai.ting.ho@polyu.edu.hk / crystal.choy@polyu.edu.hk / kristy.loh@polyu.edu.hk
Tel.: +852-2766 6574
Fax.: +852-2764 7657